SRD Spin Rinse Dryer 6in
SRD Spin Rinse Dryer 6in
- Model No. XWS-602D-6
- Capacity: Up to 15 recipes
- Max. Steps per recipe: Up to 10 steps
- With Auto-Clean Function
- The vibration is less than 350 um while rotor spinning.(200 mm/ 300 mm,300 um)
- Spin speed tolerance:Less than 10%
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Description
Our advanced wafer spin rinse dryer for semiconductor wafer fabrication suitable for wet bench facilities. Our SRD machine can be incoporated in the automation chain of the client’s facilities, making it an on-line crucial part of the semiconductor manufacturing.
Technical Data Sheet
| Model No. | XWS-602D-6 |
| Basic Function | DIW Rinse,Pipe Purge,Spin Dry,Hot N2. |
| Max Speed of spin | Up to 2,800rpm |
| N2 heating | 70℃ |
| With N2 continuous purge | Yes |
| DIW Resistance meter | Yes |
| Anti-Static Device/N2 Low flow interlock | Yes |
| EMO function | Yes |
| Capacity | 15 |
| Steps per recipe | 10 recipes |
| Auto-Clean Function | Yes |
| vibration | < 350um |
| Spin speed tolerance | < 10% |
| Rotor and bowl material | 316L-EP |
| Seal ring material | Viton |
| 腔体与轴密封类型 | Non-contact Air seal |
| Motor type | Brushless Motor. |
| N2 heater type | non-contact N2 heater |
| Filter precision | 0.003um |
| DI and N2 Valve material | PTFE |
| Size of tool | 500×695×1820mm |
| Weight of tool | 98kgs |
Drawings
Customization Service
We offer customization spin rinse dryer to meet our client’s need. Please send us your RFQ about customized product so we can provide quote and other detail for you.